Pulsed Laser Deposition (PLD) Systems
Blue Wave Semiconductors presents a fully customizable, state-of-the-art Pulsed Laser Deposition (PLD) System, engineered for the synthesis of high-quality thin films of metal oxides, nitrides, and complex multilayer device structures. This system is designed to support both fundamental research and advanced materials development, offering precise control over film composition, thickness, and crystalline quality.
The BWS PLD System features an optimized six-target carousel, a high-temperature substrate heater, and a variable-pressure chamber for controlled deposition environments. Its modular design allows seamless integration with complementary deposition techniques and sources, including sputtering, thermal evaporation, chemical vapor deposition (CVD), and e-beam systems, enabling hybrid processing and advanced material fabrication.
Blue Wave’s PLD platform provides exceptional versatility for the growth of functional thin films used in optoelectronics, superconductivity, ferroelectrics, energy storage, and sensor applications, making it an ideal tool for exploratory materials science and thin film device engineering.
Applications
1. Metal-oxide and nitride thin film deposition
2. Multilayer and heterostructure device research
3. Epitaxial and high-quality crystalline film growth
4. Ferroelectric, dielectric, and piezoelectric film development
5. Superconducting and complex oxide materials research
6. Semiconductor and optoelectronic thin films
7. Protective and functional coating deposition
8. Rapid material screening, custom material exploration, and material discovery
9. Customizable for machine learning, automation, and integration with artificial intelligence systems
- Description
- Specification
- Brochure
- Photos
- Videos
Product Description
1. High-Vacuum Deposition Chamber:
– Spherical chamber made from electro-polished 304 stainless steel.
– Multiple ports for target carousel, substrate heater, turbo pump and gate valve, viewports, laser port, and additional accessories.
– Leak-tested to 10⁻⁹ mbar·L/sec He; achieves ultra-high vacuum (UHV) levels of 5×10⁻⁷ Torr or better.
– Bakeable up to 150°C to minimize outgassing and leaks
– Adjustable chamber orientation for adjustable laser input.
2. System Framework:
– A robust clean room-grade frame designed for holding the chamber and system components.
– Integrated rackmount mounting for electronics, power distribution, and control systems.
– Equipped with mobility and leveling features for easy installation and adjustment.
3. Chamber Pumping:
– Includes an integrated Turbo Pump.
– Includes a mechanical dry pump serving as a backing pump to achieve a rough vacuum.
– Includes all relevant hardware, vacuum plumbing, and valves necessary for pumping and venting operations.
– Maximum reliability within a compact design.
– High pumping speed and maximum compression for all gases.
– Integrated drive electronics, appropriate for industrial settings.
– Continuous monitoring of operational data.
4. Dry Mechanical Pump:
– Oil-free scroll pump to prevent any hydrocarbon oil fumes that could contaminate the process.
– Oil-free maintenance for the pump.
5. Gas Flow and Pressure Control:
– Includes an enclosure that houses the system’s mass flow controllers (MFCs) and interfaces with the user’s exhaust system to mitigate any potential gas leaks.
– Blue Wave Semiconductor provides a tailored selection of MFCs for users to select from. (Please see the specification table)
– All MFCs are constructed with gas shut-off valves for an overpressure safety shut-off feature.
– A combination of gas flow and vacuum pumping is utilized to achieve the desired chamber pressure.
– Contains over-pressure safety protection.
6. Vacuum Gauge:
– Includes a full range vacuum gauge and a process vacuum gauge.
– The full range gauge measures from atmospheric pressure to 10⁻⁹ Torr.
– The process gauge enables accurate pressure measurements during operation.
– Both gauges contain a digital pressure readout.
– Includes all mounting hardware and cables.
– Easy to operate and clean, resisting metal and oxide contamination over extended use.
7. Target Carousel:
– Motorized six-position carousel allows multiple targets without venting the chamber.
– Targets rotate and raster for uniform laser ablation.
– Target clamps minimize contamination and eliminate the need for silver paste.
8. Deposition Process Pressure Automation:
– The substrate heater operates at a maximum temperature of 950˚C, with a temperature uniformity of within 10%. Additionally, it includes a stainless-steel shield equipped with six 4-40 tapped holes for sample clamping.
– The substrate heater element is sealed against exposure to reactive gases and plasma deposition.
– Includes a Blue Wave temperature controller that precisely manages the substrate heater temperature and provides it with power while providing the temperature readings.
9. Substrate Holder:
– Fully adjustable optics mount for height, angle, and distance relative to the target.
– Supports a variety of lenses to meet specific deposition requirements.
10. Deposition Process Pressure Automation:
Includes a computer equipped with custom software, which includes, but is not limited to:
• Gas flow control and monitoring
• Pressure control and monitoring
• Vacuum measurements
• Target Carousel Control and monitoring
• Temperature control and measurement of the substrate heater
• Adjustable safety interlocks
Optional Upgrades
OP-1. Additional Gas/Mass Flow Controller:
– The user may add up to 4 additional MFCs into the system. The gases associated with the MFCs may include, but are not limited to, Nitrogen (N₂), Argon (Ar), and additional gases.
– Contact Blue Wave for additional mass flow controller selection.
OP-2. Rotation Speed Adjustment:
– Enables the substrate holder to operate at variable speeds.
OP-3. Two-Color IR Pyrometer for Sample Temperature Measurement:
– A two-color infrared pyrometer designed for temperature monitoring via optical fiber, featuring a bright LED digital display. It is ideally suited for highly precise measurement of MPCVD sample temperatures. The device offers exceptional speed and accuracy, with a response time of 10 milliseconds and an accuracy of 0.2% of the full scale.
OP-4. Load Lock Wafer Transfer Mechanism:
– A chamber isolated with a gate valve that allows for in-situ sample transfer.
– Contains an additional vacuum gauge for load lock pressure readings.
– Contains a sample loading arm.
OP-5. Add Sputtering, Electron Beam Evaporator, or Thermal Evaporator:
– The PLD chamber can integrate with other CVD systems. Contact Blue Wave Semiconductor for more information.
OP-6. Add Laser:
– The Blue Wave PLD system can work with multiple types of lasers. The two common lasers used for the PLD system are an excimer laser and a solid-state laser. Blue Wave can find the best laser to fit the customers’ needs or the customer can purchase the laser separately.
Product Specification
| Specification | Parameter |
|---|---|
| Vacuum With Turbo Pumb | 5 × 10-7 Torr |
| Temperature Range | 50 – 950°C |
| Gas Flows (MFCs) | – Oxygen (O2) 0 – 200 SCCM (Customizable) – Optional additional MFCs |
| System Input Power | One 120 VAC 1Φ 20A power source (Customizable) |
| Vacuum Pump | Dry Pump |
| Turbo Pump Speed | 90 L/s |
| Mechanical Pump Speed | 15 m3/hr |
| Vacuum Seals | Viton Gaskets, Copper Gaskets |
| Deposition Area | .5” to 2” Diameter |
| Deposition Rate | .1 – 1 angstrom per second |
| Substrate Holder | Stainless Steel |
| System Chamber | Stainless Steel |
| Interlock Control | – Over Pressure – Chamber Temperature – Emergency Stop |
| System Size | – Width: 3 ft – Depth: 2 ft – Height: 6 ft |
Brochure
Photos









