Diamond Exploratory & Applied Research Microwave Plasma CVD (DEAR- MPCVD)

Product Description

1. Deposition Chamber: Deposition chamber (quartz tube) designed with accessories that allows production of a high-quality crystal growth of CVD diamond without silicon impurity incorporation from the quartz wall. Substrate stage capable of holding up to 1x1cm2 inch diameter substrate. The Quartz tube reaction chamber and microwave cavity are cooled using combined water and airflow.

2. Vacuum Pump: DEAR MPCVD system comes with mechanical dry pump with base pressure better than 2×10-2 Torr for evacuating main CVD chamber. Includes all applicable hardware, vacuum plumbing, and valves for pumping and venting operations.

3. Pressure Gauge: Full range pressure gauge to provide an accurate pressure read. Blue Wave deposition system also has built in interlocks for over pressure safety protection.

4. Process Gas Flow Meters: Gas flow meters are designed to control gas flows in a wide variety of flow ranges adequate for deposition of high-quality thin films. All MFCs are calibrated for specific gases. All MFCs are constructed with gas shut-off valves for over pressure safety.

5. Deposition Process Pressure Automation: Blue Wave integrates a pressure controller that can precisely control automatic deposition process pressure from 10 Torr to 200 Torr.

6. Substrate Holder: Blue Wave integrates water cooled Moly sample stage. Sample stage height can be adjusted using molybdenum disks (multiples of 0.5 mm, 1mm, 3 mm thick disks) in reference to plasma ball to control the temperature of the substrate from 700°C to 1200ᵒC.

7. Computer control: Blue Wave offers computer control monitor and software with the following features:Ability to control gas flow.

7.1. Ability to control pressure of the chamber during the process.

7.2. Ability to control microwave power and display live readouts such as forward and reflected power.

7.3. Ability to read vacuum.

7.4. Ability to monitor temperature measurements.

7.5. Process steps and process recipes easy load to and run program.

7.6. Process graph containing gases, pressure, and temperature.

7.7. Also includes safety protection features such as warnings and shut off for overpressure, airflow, water flow, gas flow deviations, high microwave reflected power etc.

8. Microwave Components for MPCVD: The Microwave CVD system will have 1.5 kW microwave power supply, magnetron, short circuit, and manual 3-stub tuner.

9. Equipment Frame: An aluminum frame with front panels mounted on 19” DIN rack rails within the frame and enclosure.

Optional Upgrades

OP-1. Additional Gas/Mass Flow Controller: The user may add up to 6 additional MFCs into the system. The gases associated with the MFCs may include, but are are not limited to, Nitrogen (N₂), Argon (Ar), and various dopant gases. Contact Blue Wave for additional mass flow controller selection.

OP-2. High Vacuum using a Turbo Molecular Pump: A Turbo Molecular Pump, including a controller, can be integrated to achieve a high vacuum better than 5×10⁻⁶ Torr. This option encompasses the necessary valves and high vacuum programming logic, which are prepared for high vacuum creation to initiate deposition with appropriate gas flow and to attain suitable process pressure for microwave plasma deposition.

OP-3. Two-Color IR Pyrometer for Sample Temperature Measurement: A two-color infrared pyrometer designed for temperature monitoring via optical fiber, featuring a bright LED digital display. It is ideally suited for highly precise measurement of MPCVD sample temperatures. The device offers exceptional speed and accuracy, with a response time of 10 milliseconds and an accuracy of 0.2% of the full scale.