Sputtering System
The BWS Sputtering System is a fully customizable state-of-the-art physical vapor deposition system designed for the synthesis of high quality thin films and thin film research.
The Sputtering System offers a variety of built-in and custom features such as: optimized 3-gun flange, substrate heater, pressure adjustment, and is designed for easy integration with a variety of other deposition techniques and sources such as: PLD, Thermal Evaporation & CVD, E-beam, and more.
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Product Description
Applications
- Optical Transparent Coatings
- Oxide and Nitride Coatings
- Die-electric (low or high-k) Coatings
- Metallic Coatings
- Multilayer thin films and devices
Features
- Customizable stainless steel reactor chamber
- Compact PVD system design for easy transport
Custom Options Available:
- Custom flange for up to 3 sputtering gun design for quick changing of the deposition material
- BWS rotating substrate heater capable of reaching temperatures up to 800°C (900°C for the fixed or non-rotatable design)
- Optional linear motion z-stage for vertical axis adjustment of the substrate
- Optional load lock with gate valve and transfer arm for easy sample removal
- Turbo/Cryopump
- Optional automated system control via La bView software
- 10″ quick access door for sample transfer
Product Specification
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Brochure
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Photos
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Videos
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