Hot Filament Chemical Vapor Deposition(HFCVD) System

Product Description

1. High-Vacuum Deposition Chamber

• The chamber is constructed of stainless steel with double walls and is water-cooled, ensuring optimal growth conditions.
• The vacuum chamber is subjected to leak testing with helium at a minimum of 10⁻⁹ mbar-L/sec.
• Supports high vacuum operation with multiple ports for sample loading, viewing, and instrumentation.
• Customizable windows and access points allow in-situ observation and process flexibility.
• Constructed for durability and long-term use under high-temperature conditions.

2. System Framework

• A robust clean room-grade frame designed for holding the chamber and system components.
• Integrated rackmount mounting for electronics, power distribution, and control systems.
• Equipped with mobility and leveling features for easy installation and adjustment.

3. Chamber Pumping:

• Includes an oil mechanical pump capable of achieving high vacuum levels better than 5×10⁻³ Torr.
• Includes all relevant hardware, vacuum plumbing, and valves necessary for pumping and venting operations.
• Compact, efficient design optimized for stability and long-term use.
• If selected, a turbo pump will further pump down the chamber achieving high vacuum levels better than 1×10⁻⁶ Torr.

4. Oil Mechanical Pump

• High-performance rotary vane oil pump optimized for process stability.
• Equipped with an isolation valve to protect against back-streaming.

5. Gas Flow and Pressure Control

• Includes an enclosure that houses the system’s mass flow controllers (MFCs) and interfaces with the user’s exhaust system to mitigate any potential gas leaks.
• Blue Wave Semiconductor provides a tailored selection of MFCs for users to select from. (Please see the specification table)
• All MFCs are constructed with gas shut-off valves for overpressure and cross contamination prevention.
• Includes a closed-loop pressure controller for precise pressure regulation.
• Contained in the ventilated gas cabinet is a pressure relief valve for maximum safety.

6. Vacuum Gauge

• Includes a combination gauge integrating capacitance and Pirani measurement methods.
• If a turbo is added, a full range gauge will be provided to measure from atmospheric pressure to 10⁻⁹ Torr.
• The gauge contains a digital pressure readout.
• Includes all mounting hardware and cables.
• Easy to operate and clean, resisting metal and oxide contamination over extended use.

7. Filament Power and Replacement

• High current DC power supply capable of heating filaments to temperatures required for deposition.
• Filament holder designed for easy installation and replacement of filaments.
• Water flow interlock included.

8. Substrate Holder/Adjustment

• Rotation and distance adjustment via Z-stage improve uniformity of deposition.
• Temperature monitored and regulated for reproducible results.
• Accommodates substrates up to 8-inch.

9. System Cooling

• Water-cooled components maintain stable operation during high-temperature processes.
• Designed to enhance process stability and repeatability.
• Components that necessitate water cooling will be directed to a shared flow indicator located near the rear of the assembly.

10. Computer Control

• Includes a computer equipped with custom software, which includes, but is not limited to:
  • – Gas flow control and monitoring
  • – Pressure control and monitoring
  • – Vacuum measurements
  • – DC current and voltage control and monitoring
  • – Temperature measurement (If selected)
  • – Adjustable safety interlocks
  • – A library for users to save custom recipes

Optional Upgrades

• • OP-1. Additional Gas/Mass Flow Controller:
    • The user may add up to 6 additional MFCs into the system. The gases associated with the MFCs may include, but are are not limited to, Nitrogen (N₂), Argon (Ar), and various dopant gases.
    • Contact Blue Wave for additional mass flow controller selection.
  • OP-2. High Vacuum using a Turbo Molecular Pump:
    • A Turbo Molecular Pump, including a controller, can be integrated to achieve a high vacuum better than 5×10⁻⁶ Torr. This option encompasses the necessary valves and high vacuum programming logic, which are prepared for high vacuum creation to initiate deposition with appropriate gas flow and to attain suitable process pressure for microwave plasma deposition.
  • OP-3. Two-Color IR Pyrometer for Sample Temperature Measurement:
    • A two-color infrared pyrometer designed for temperature monitoring via optical fiber, featuring a bright LED digital display. It is ideally suited for highly precise measurement of MPCVD sample temperatures. The device offers exceptional speed and accuracy, with a response time of 10 milliseconds and an accuracy of 0.2% of the full scale.
  • OP-4. Large Area Hot Filament Chemical Vapor Deposition (LAHFCVD) Upgrade::
    • The HFCVD can be upgraded to accommodate up to an 8-inch wafer. The LAHFCVD can either deposit on one 8 Inch or multiple smaller substrates. This upgrade increases the components of the system such as the chamber size, frame size, etc.
  • OP-5. Load Lock Wafer Transfer Mechanism:
    • A chamber isolated with a gate valve that allows for in-situ sample transfer.
    • Contains an additional vacuum gauge for load lock pressure readings.
    • Contains a sample loading arm.
  • OP-6. Substrate Heater and Temperature Controller
    • The substrate holder may be upgraded to incorporate a Blue Wave brand Inconel substrate heater for precise substrate temperature regulation and monitoring.
    • The substrate heater operates at a maximum temperature of 600˚C, with a temperature uniformity of within 10%. Additionally, it includes a stainless-steel shield equipped with six 4-40 tapped holes for sample clamping.
    • The substrate heater element is sealed to prevent exposure to reactive gases and plasma during deposition.
    • Includes a Blue Wave temperature controller that precisely manages the substrate heater temperature, powers it, and provides temperature readings.