Thermal Evaporator System

Product Description

1. High-Vacuum Deposition Chamber
– The chamber is constructed from PYREX glass with a 16-inch diameter and 20-inch height, providing a see-through high‑vacuum environment.
– The system achieves a base pressure better than 3×10⁻⁶ Torr when clean, dry, and properly conditioned.
– Designed for easy and fast access to the full internal chamber volume, enabling efficient workflow during deposition processes.
– Supports repetitive batch processing with simple loading and unloading of substrates, evaporation materials, and sources, while allowing clear visual monitoring during operation.
– Equipped with well‑designed flange ports for the turbo‑molecular pump, evaporation assembly, vacuum gauge, substrate holder, sample‑loading access, accessories, and optional substrate heating.
– Engineered for thin‑film research, prototype device fabrication, and deposition of metals, optical coatings, selective oxides, and polymer materials.

2. System Framework
– A robust clean room-grade frame designed for holding the chamber and system components.
– Integrated rackmount mounting for electronics, power distribution, and control systems.
– Equipped with mobility and leveling features for easy installation and adjustment.

3. Chamber Pumping:
– Includes an oil mechanical pump capable of achieving high vacuum levels better than 9×10⁻³ Torr.
– A turbo pump will further pump down the chamber, achieving high vacuum levels better than 3×10⁻⁶ Torr.
– Includes all relevant hardware, vacuum plumbing, and valves necessary for pumping and venting operations.
– Compact, efficient design optimized for stability and long-term use.

4. Oil Mechanical Pump:
– High-performance rotary vane oil pump optimized for process stability.
– Equipped with an isolation valve to protect against back-streaming.

5. Vacuum Gauge
– Utilizes a full‑range vacuum gauge capable of measuring from atmospheric pressure down to 1×10⁻⁸ Torr
– The gauge contains a digital pressure readout.
– Includes all mounting hardware and cables.
– Easy to operate and clean, resisting metal and oxide contamination over extended use.

7. Thermal Evaporation Source
– A high‑current evaporation source assembly equipped with tungsten filament and robust feedthroughs for stable deposition performance.
– A dedicated power supply designed to deliver the required current for reliable source heating.
– A manually operated shutter positioned over the substrate to control deposition exposure.
– Integrated shielding to minimize cross‑contamination during evaporation processes.

8. Substrate Holder/Adjustment
– A mechanically clamped substrate holder designed to support wafers up to 4 inches in diameter securely.
– Operates at room temperature with an option to integrate a substrate heater for expanded process capability.
– Allows quick and simple clamping and removal of samples for efficient workflow.

10. Computer Control
– Includes a computer equipped with custom software, which includes, but is not limited to:
• Vacuum measurements
• Power control and monitoring
• Thickness measurement (If selected)
• Adjustable safety interlocks

Additional Options Available

OP-1. Dry Pump
• Contact Blue Wave to ask if this option is required.

OP-2. Substrate Heater and Temperature Controller
• The substrate holder may be upgraded to incorporate a Blue Wave brand Inconel substrate heater for precise substrate temperature regulation and monitoring.
• The substrate heater operates at a maximum temperature of 600˚C, with a temperature uniformity of within 10%. Additionally, it includes a stainless-steel shield equipped with six 4-40 tapped holes for sample clamping.
• The substrate heater element is sealed against exposure to reactive gases and plasma deposition.
• Includes a Blue Wave temperature controller that precisely manages the substrate heater temperature and provides it with power while providing the temperature readings.

OP-3. System Gas Flow
• The system may be integrated with a mass flow controller (MFC) and needle valve to flow gas into the chamber during deposition.

OP-4. Quartz Monitor Crystals for In-Situ Thickness Measuring
• The system integrates high‑precision quartz crystal monitoring for accurate in‑situ film thickness measurement and real‑time deposition rate control.
• The quartz crystal sensors are industry‑proven for stability, accuracy, and long‑term reliability across a wide range of thin‑film materials and processes.
• A single manually shuttered crystal sensor is positioned near the substrate to ensure precise, localized measurement during deposition.