Request a Quote for Deposition System

Deposition Techniques (*Required)

Please select or specify an deposition technique in which the heater will be used.

 Thermal Evaporator Hot Filament Chemical Vapor Deposition / HFCVD Electron Beam Evaporator Thermal Chemical Vapor Deposition / TCVD Pulsed Laser Deposition Reactive Sputtering Other

Growth Process Ambient (*Required)

The gasses used in your deposition process will determine the material your heater will be made out of and the maximum achievable temperature.

 Oxygen Ammonia Hydrogen Methane Silane Fluorine Chlorine Nitrogen Argon Inert Other

Heating stage diameter (*Required)

Whether you are heating small substrates or full size wafers, we can provide a heater to fit your needs.

1.0 2.2 3.1 4.1 5.1 6.1 

Maximum Temperature Requirement (*Required)

The substrate heater can operate in a range of temperatures from room temperature to 1000C. Your temperature range can be limited by whether your processing environment contains reactive gases

 Room Temperature - 600 °C max. Room Temperature - 750 °C max. Room Temperature - 850 °C max. Room Temperature - 1000 °C max. (Vacuum only)

Vacuum compatibility (*Required)

We can supply you with a heater for high vacuum, low vacuum, and normal atomspheric pressure.

 10-3 Torr - Atmospheric Pressure 10-8 Torr - Atmospheric Pressure Only High Vacuum (10-5 - 10-8 Torr)

Questions/Comments: Feel free to submit any additional comments and questions.

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