Inconel Substrate Heater for Reactive Deposition

Built for precision temperature control and uniform heating, the Inconel Substrate Heater is the perfect tool for a variety of thin film applications. The oxidation and chemical resistant metal alloy heater is designed to reach temperatures up to 850°C. It is compatible with reactive sputtering, PLD, PVD, e-beam, thermal evaporation, PECVD, ALD, in UHV or inert (Ar, N2, He, H2) and reactive O2, Ozone,  CO2,  C2H2, CH4, NH3, SiH4, H2O, air and metal-organic precursors from pressure 10E-1 Torr through high vacuum up to 10E-8 Torr.

The temperature uniformity is within 5-10%. All substrate heater models come with stainless steel shield/collar with 6 x4-40 tapped holes for sample clamping.  They have integrated inbuilt K-type thermocouple (with 24″ inch long flexible fiber glass shielded cables) mounted from backside approaching near the surface of the hot surface for accurate temperature measurement. Heater and thermocouple wires have two 36″ long glass fiber insulated and flexible conductors for heater power and temperature measurement, respectively.

Blue Wave’s heater’s back plate has one 10-32 tapped hole in the center for heater mounting. The Inconel Substrate Heater is suitable for epitaxial growth, doping, catalytic reactions, in-situ surface science as a function of temperature, and annealing of oxides, nitrides, carbides, metals, alloys, graphene, CNTs, diamond and complex multicomponent and multilayer thin films. It can also be used for gas sensor characterization, temperature dependent electrical measurement of devices at high temperature in air, vacuum or N2 atm.


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Substrate Heaters

Model: SH-IN

Product Description

The Inconel Substrate Heater is an oxygen compatible heater designed for thin film oxide based processes and vacuum applications such as: pulsed laser deposition(PLD), reactive sputtering, chemical vapor deposition(CVD), thermal evaporation, and more. With precision temperature control and heating uniformity, these heaters are the perfect tool for deposition of thin film materials.


  • Vacuum Annealing, Doping, Catalytic Reaction
  • In-Situ Surface Science, R & D
  • Gas Sensor Temperature dependent Characterization
  • Epitaxy of Oxides, Nitrides, Carbides, Metals

Key Features

  • Operating temperatures up to 850°C
  • Compatible with reactive gases such as O2, NH3, SiH4, CH4
  • Vacuum compatibility from 10-8 Torr to 10-1 Torr
  • Oxidation, corrosion, and chemical resistant inconel alloy material
  • Heating element collar for element protection



  • Maximum temperature of operation up to 850°C
  • Vacuum compatibility 10-8-10-7Torr
  • Integrated in-built k-type temperature sensor thermocouple with extended flexible and insulated thermocouple wires
  • Flexible glass fiber insulated wire conductors for powering
  • Inconel collar with tapped holes for substrate clamping
  • Available sizes From 0.5″ to 6″ diameter
  • Bias capability
  • Precision temperature
  • PID controlled power supply 110V-220V
  • Easy to Install

Technical Drawings

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