Substrate Heaters - Inconel Heaters





Inconel SH_Figure A

 Specifications
     » Maximum temperature of operation up to 850°C

     » Vacuum compatibility 10-8 -10-7 Torr and
        operating pressure compatibility from 10-8 Torr
        to 1000 Torr

     » Integrated in-built k-type temperature sensor
        thermocouple with extended flexible and
        insulated thermocouple wires

     » Flexible glass fiber insulated wire conductors
        for powering 

     » Collar with tapped holes for substrate clamping

     » Available sizes From 0.5” to 6” diameter

     » Bias capability

     » Precision temperature

     » PID controlled power supply 110V-220V

     » Easy to Install

    

    

     
Model Number
ø
A
B
C
Weight
SH 1.6 - IN
1.6"
2.0"
1.0"
3.3"
0.5 lb
SH 2.2 - IN
2.2"
2.6"
1.0"
3.3"
0.5 lb
SH 3.1 - IN
3.1"
3.5"
1.0"
5.0"
1.0 lb
SH 4.1 - IN
4.1"
4.5"
1.0"
5.0"
3.0 lb

Oxygen compatible heaters are good for thin film oxide based processes (pulsed laser deposition, reactive sputtering, CVD) and are also good for vacuum applications (thermal evaporation, reactive depositions). These heaters are excellent for deposition of thin film materials.

These heaters are limited to 850°C (longer life than used at 900C). Operating gas pressures of reactive gases such as O2, NH3, SiH4, CH4, etc. range from 10 -7 Torr to atmospheric pressure (760 Torr).
Photos:


Videos:
MRS Heater Demo 2008.wmv, Sputtering Process.mpg, 2 Inch Heater Demo.wmv

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