Physical Vapor Deposition System

 Specifications
     » Deposition system built ready for several
        deposition processes from sputtering to PLD to
        E-beam, and more

     » Vacuum levels from atmosphere to 10-8 Torr
           ( 10-8 Torr upon request of turbopump option)

     » Built-in water cooling available upon request
    
     » Mass Flow controllers for a wide variety of
        gases and flow rates (0-500 sccm)

     » Stainless steel gate valve

     » Electro-polished stainless steel, multiport
        chamber (available in 12" or 18" diameters)

     » Vacuum gauges for base and process pressure
        monitoring

     » Substrate heater reaching temperatures up to
        850°C and heater power supply unit option
        available upon request

         

    

     

The BWS PVD System is an affordable, innovative solution to leading edge research and development in thin film applications. Its basic system configuration allows for excellent and repeatable processes in thin film development. The versatility and user friendliness of the system opens up it's usage to a wide variety of users from the researcher new to thin film synthesis, to an expert wanting to expand PVD integration with other deposition techniques for advanced research.
Summary of Options Available:

-  Substrate Heater reaching temperatures up to 850°C
-  Substrate rotation(up to 10 rpm max) for uniform deposition
-  Motorized stage control for adjustment of substrate stage height
-  Additional MFCs, user specified
-  Target Assembly (capable of holding three targets)
-  Computerized recipe control (LabView)
-  Turbopump and mechanical pump for reaching higher levels of vacuum

For more information, and to find out more about the custom options
available, email us at info@bluewavesemi.com
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